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Tribochemical Nanolithography: Selective Mechanochemical Removal of Photocleavable Nitrophenyl Protecting Groups with 23 nm Resolution at Speeds of up to 1 mm s¬–1
Data for this paper, including AFM images and spreadsheets used to generate graphs and line sections in Figures 1-4, 6 and 7.
Information on the calculations leading to Figure 5 in the paper is provided in the electronic Supplementary Information file available from the publisher's web site.
Funding
Centre for Doctoral Training in Basic Technologies for Molecular-Scale Engineering
Engineering and Physical Sciences Research Council
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- There is no personal data or any that requires ethical approval
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- The data complies with the institution and funders' policies on access and sharing
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- The data can be shared openly
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- The file formats are open or commonly used
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Categories
- Analytical chemistry not elsewhere classified
- Sensor technology (incl. chemical aspects)
- Catalysis and mechanisms of reactions
- Colloid and surface chemistry
- Photochemistry
- Nanochemistry
- Optical properties of materials
- Physical properties of materials
- Soft condensed matter
- Functional materials
- Nanofabrication, growth and self assembly
- Nanomaterials
- Nanophotonics
- Nanoscale characterisation
- Micro- and nanosystems
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