Tribochemical Nanolithography: Selective Mechanochemical Removal of Photocleavable Nitrophenyl Protecting Groups with 23 nm Resolution at Speeds of up to 1 mm s¬–1
<p>Data for this paper, including AFM images and spreadsheets used to generate graphs and line sections in Figures 1-4, 6 and 7.</p>
<p>Information on the calculations leading to Figure 5 in the paper is provided in the electronic Supplementary Information file available from the publisher's web site.</p>
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Centre for Doctoral Training in Basic Technologies for Molecular-Scale Engineering
Engineering and Physical Sciences Research Council
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